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diamond-like carbon DLC • chromium nitride CrN • chromium oxide Cr2O3
aluminum nitride AlN • aluminum oxide Al2O3 • silicon carbide SiC
diamond-like carbon DLC • silicon carbide SiC • silicon oxide SiO2
chromium nitride CrN • chromium oxide Cr2O3
fluorinated diamond-like carbon DLC:F • silicon carbide SiC
micro- and nanostructuring for superhydrophobic surfaces
silicon oxide SiO2 • chromium oxide Cr2O3 • plasma etching for achieving superhydrophilic surfaces
silicon oxide SiO2, aluminum oxide Al2O3 • metallic films for mirrors
Sputter-PVD coater with magnetrons, plasma sources, recipes for computer controlled depositon
Combined PVD/Plasma-CVD coater, equipped with magnetron- and plasma-sources, recipes
Standard equipment is the STARON 80-100, modifications on request, (more ...)
Plasma-CVD equipment with plasma sources, computer controlled depositon, recepies included
Standard equipment is the STARON 100-120, modifications on request, (more ...)
Deposition equipment according to specific coatings needed, with sources and control engineering
Equipment for plasma- and vacuum treatment including technology and control engineering (more ...)
According to our clients demands, PT&B GmbH develops specific technologies and coatings