SILCOR®GR (Electronically highly conductive amorphous carbon)

SilCor®GR is a three-dimensional cross-linked amorphous graphite film, which is evident from the high fraction of carbon atoms in sp2-hybridization (about 90%) and a significant mechanical hardness. The coating is deposited by means of magnetron sputtering, which is a special type of PVD technology. Neither hydrogen nor a metal is added during the coating process. For the sake of increasing the conductivity of the films, usually n-type doping is applied. On request, modification of the coating process by the addition of hydrogen or a metal is optional.

Deposition by magnetron sputtering (PVD) in various types of deposition apparatuses

(1) stationary mode, 5 inch magnetron within a wafer deposition apparatus

(2) stationary or dynamic mode (single or twofold rotation), 30 inch rectangular magnetrons

metallic adhesion layer of 100nm of chromium (titanium or aluminum on request)

Properties of SilCor®GR

Film thickness: 400 nm (standard), alternative 10 nm to 10.000 nm

Surface roughness: Ra = 5 nm, Rz = 30 nm (standard coating)

Plastic universal hardness: U_H = 10 GPa (5 mN load, standard coating)

Martens hardness H_M = 6 GPa (5 mN load, standard coating)

Vickers hardness: HV_0.005 = 950

Young’s modulusl: E = 135 GPa

Elastic deformation: W_E/P = 55 %

Specific resistivity 0,01 Ωcm (optimum n-type doping), undoped 10 Ωcm

Alloying the film with metals or hydrogen results in values of 10^-4 ... 10¹¹ Ωcm

Temperature coefficient of resistivity about -0,2 10^-3 (standard coating)

Adhesion according to Rockwell-test: HF1

Distinct electronic field emission (“cold cathode” effect)

Applications

Electron beam optics and lenses – in general – vacuum electronics

thin film precision resistors, electric conducting paths for high-temperature applications

cold cathode devices